Опис навчальної дисципліни

The purpose of the course – the formation of knowledge that promotes the development of practical skills and understanding of theoretical issues related to the basic principles, principles and problems of integrated circuit technology, design, manufacture and application of microelectronic products, basic stages of technological processes: physical and chemical methods films; methods of control over their most important technological parameters; lithography; ion implantation and epitaxy.

Learning outcomes:

know:
Basic film elements of microelectronics devices.
Methods of obtaining thin films.
Principles of designing installations for obtaining thin films.
The most important parameters that characterize thin-film samples and methods of their control.

be able:
Work with systems for applying films in vacuum.
Make the simplest evaporators for thermal evaporation of material.
Determine the thickness, surface roughness and coefficient of uniform thickness.
Determine the adhesion of films.
Apply protective masking coatings by photolithographic method.
Obtain thin films of metals by electrochemical deposition from aqueous solutions of their salts.